WebLocal maxima on the swing curve correspond to film thicknesses that shift the reflected energy phase by 180º relative to the incident wave (i.e. peak destructive interference) … Web9 jun. 1995 · Multilayer process of T-shaped transistor gates for GaAs-pseudomorphic HEMTs using e-beam resist technology and i-line negative resist with optical stepper lithography, Proceedings of SPIE 10.1117/12.210407 DeepDyve DeepDyve Get 20M+ Full-Text Papers For Less Than $1.50/day. Learn More →
3.2.1 Focus Effects and Process Window - TU Wien
Web2. Standing Waves and Swing Curves 2.1. Standing Waves Purpose: The purpose of this section is to describe how standing waves come about and how to reduce them. Objectives: Upon completion of this section, you will be able to: Describe the basic principle of standing wave formation Describe the four ways to reduce the standing wave effect WebThe effect of stepper focus on swing curve amplitude has been studied and, for substrate dimensions, amplitude increases as focus moves away from its optimum setting. Resist … datafaction and agilink software
半导体的重中之重--曝光工艺! - 知乎
WebAnticipation of dimensional issues caused by topography during photo lithography. Photomask Technology 2011 conference. Proc. of SPIE Vol. 8166 20 septembre 2011 ... planarizing, spin-coating, OPC, swing curve, double patternin Voir moins Autres auteurs. Voir la publication. Langues French Bilingue ou langue natale English WebS1813 Spin Coating. This resist allows thicknesses from 1.2 to 2.0 µm. With Shipley 1813, 2 standard thicknesses have been chosen to be used in the MicroFab: 1.4 and 2.0 µm. … Web7 jun. 1996 · In this paper, swing curve characteristics of half-tone PSM (8 percent transmittance) with off- axis illumination are investigated. They are compared with the swing curve features of binary masks under the same off-axis illumination. I-line stepper (0.57NA) is used with annular illumination ((sigma) 0.6-0.4) for HTPSM and binary mask. Equal … datafaction imaging